技术设备每周5天24小时持续生产，为IC，Discrete Device，SOI，PV等高新技术设备所需的4-6英寸硅片提供专业的离子注入服务。
Implant Process Capability
|
Recipe Category |
Tool type |
Species |
Energy,kev |
Does, Ions/c㎡ |
notes |
|
High Current (batch) |
NV10-80's |
B/BF2,P,As,H |
10-80kev |
7E14-1E16+ |
|
|
NV10-160's |
B/BF2,AI,As, Sb,H,(P*) |
10-160kev |
7E14-1E16+ |
*NON-P tool available |
|
|
Mid Current (Serial) |
MC3's |
B/BF2,P,As,In |
5-750kev |
5E11-1E15 |
|
|
6200 series |
B/BF2,P,As |
10-200kev |
5E11-7E14 |
|
|
|
CF Series |
B/BF2,P,As |
10-200kev |
5E11-7E14 |
|
|
|
4200 series |
Non-dopants (Si,Ge) |
10-200kev |
5E11-1E16 |
|
可以承接> 5 MeV 的超高能注入需求