KingCore facility technology operate 24 hours by 5 days a week and serve ion implant requirements for 4inch to 6 inch wafers including IC, Discrete Device, SOI, PV and other advanced applications
Implant Process Capability
Recipe Category |
Tool type |
Species |
Energy,kev |
Does, Ions/c㎡ |
notes |
High Current (batch) |
NV10-80's |
B/BF2,P,As,H |
10-80kev |
7E14-1E16+ |
|
NV10-160's |
B/BF2,AI,As, Sb,H,(P*) |
10-160kev |
7E14-1E16+ |
*NON-P tool available |
|
Mid Current (Serial) |
MC3's |
B/BF2,P,As,In |
5-750kev |
5E11-1E15 |
|
6200 series |
B/BF2,P,As |
10-200kev |
5E11-7E14 |
|
|
CF Series |
B/BF2,P,As |
10-200kev |
5E11-7E14 |
|
|
4200 series |
Non-dopants (Si,Ge) |
10-200kev |
5E11-1E16 |
|