Core's specialty implant service has over 20 years of technology development in the production of non-traditional and exotic ion species utilizing a variety of substrates. This includes a capability to implant unusual and irregularly shaped substrates with over 70 different ion species
Key features & capability
- The ability to implant from small samples up to 200 and 300 mm wafers with a wide range of ion species
- GaAs and other compound semiconductors are regularly implanted with 28Si,29Si,Zn,Be,Mg,H,He,and O
- Implant Energies from 1kev to 200 keV single charged
- Doubly charge species ( for 400 keV)are routinely run
- High tilt angles to 89 degrees
- Low temperature implants to LN2 temperatures
- High temperature implants to 650 C and higher
- Process support for implant recipe generation, pre &post implant processing, and materials characterization
Dedicated Specialty Tools:
- Indium implantation tool for 200 and 300 mm wafers
- Germanium implantation expertise for pre amorphization-100 to 300 mm wafers
- Dopant-free system for 100 to 150 mm wafers
Ample data demonstrating contamination control spanning 8 years
Ideal for pre amorphization and radiation treatment implants
- Dedicated GaAs and other compound semiconductor wafer system
Fast tumaround for 100 mm wafers
- Dedicated Helium and Hydrogen implantation systems
All Specialty implanters are calibrated to NIST traceable standards
Standard turn around for Specialty implants is 3-5 days, but with advanced notice,same-day cycle time can be arranged.
•Low temperature implants to LN2 temperatures
•High temperature implants to 650 C and higher
•Process support for implant recipe generation, pre &post implant processing, and materials characterization
Dedicated Specialty Tools:
•Indium implantation tool for 200 and 300 mm wafers
•Germanium implantation expertise for pre amorphization-100 to 300 mm wafers
•Dedicated GaAs and other compound semiconductor wafer system
•Dedicated Helium and Hydrogen implantation systems